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Single-monolayer SiNx embedded in TiN : A first-principles study

机译:TiN中嵌入的单层SiNx:第一性原理研究

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摘要

The dynamical and thermodynamic stability of a single monolayer of SiNx sandwiched isostructurally between B1-TiN(001) and (111) oriented slabs are investigated by means of density functional theory. Possible dynamical stabilization of the (001) interface, by distortion of the Si-N bonds, is considered and found to almost, but not completely, remove the phonon instabilities. The (111) interface on the other hand is found to be dynamically stable. We furthermore relax the stoichiometry degree of freedom by allowing for Si vacancies in the lattice and show that the ideal 1:1 SiN stoichiometry in both interfaces are thermodynamically unstable with respect to Si vacancy formation regardless if the system is grown under nitrogen-rich or nitrogen-poor conditions, and therefore ruling out its relevance for performance of real materials.
机译:利用密度泛函理论研究了单分子SiNx单层夹层在B1-TiN(001)和(111)取向平板之间的动力学和热力学稳定性。考虑到并且发现通过Si-N键的扭曲可能的(001)界面的动态稳定化几乎但不是完全消除声子不稳定性。另一方面,发现(111)接口是动态稳定的。我们进一步通过允许晶格中存在Si空位来放宽化学计量学的自由度,并表明,无论系统是在富氮还是氮下生长的,两个界面上理想的1:1 SiN化学计量相对于Si空位的形成都是热力学不稳定的-恶劣的条件,因此排除了其与真实材料性能的相关性。

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